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Journal of the Korean Chemical Society (JKCS)

ISSN 1017-2548(Print)
ISSN 2234-8530(Online)
Volume 43, Number 4
JKCSEZ 43(4)
August 20, 1999

Title	Sample Pretreatment for the Determination of Metal Impurities in Silicon Wafer 실리콘 웨이퍼 중의 금속 불순물 분석을 위한 시료 전처리
Author	H. Y. Chung, Y. H. Kii, H. D. Yoo, S. H. Lee 정혜영, 김영훈, 유학도, 이상학
Keywords
Abstract	실리콘 웨이퍼 중의 금속 불순물을 유도결합플라스마-질량분석기(ICP-MS}로분석하기 위한 시료의 전처리 방법으로 마이크로파 분해법과 산분해법을 비교하였다 HNO3-HF 혼합용액을 실리콘 웨이퍼 시료에 가하고 마이크로파 분해법과 산분해법으로 용해시킨 후, 용액의 실리콘 매트릭스는 증발 용기 안에서 Si-F의 형태로 증발시켜 분석하였다. 실제 시료에 spike한 Ni, Cr 및 Fe의 회수율은 두 전처리 방법에서 95∼106%였다. Cu의 경우는 산분해법이 회수율이 더 좋았고, Zn의 경우는 마이크로파 분해법으로 전처리 한 경우의 회수율이 더 좋았다 Spin coater로 Fe를 오염시킨 실리콘 웨이퍼를 산분해법과 마이크로파 분해법으로 전처리하여 ICP-MS로 분석한 결과, Fe의 농도는 위의 두 전처리 방법에서 거의 차이가 없었다. The analytical results obtained by microwave digestion and acid digestion methods for sample pretreatment to determine metal impurities in silicon wafer by inductively coupled plasma-mass spectrometry (ICP-MS) were compared. In order to decompose the silicon wafer, a mixed solution of HNO3 and HF was added to the sample and the metal elements were determined after removing the silicon matrix by evaporating silicon in the form of Si-F. The recovery percentages of Ni,Cr and Fe were found to be 95∼106% for both microwave digestion and acid digestion methods. The recovery percentage of Cu obtained by the acid digestion method was higher than that obtained by The microwave digestion method For Zn, however, the microwave digestion method gave better result than the acid digestion method. Fe was added to a silicon wafer using a spin coater. The concentration of Fe in this sample was determined by lCP-MS, and the same results were obtained in thetwo pretreatment methods
Page	412 - 417
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