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Journal of the Korean Chemical Society (JKCS)

ISSN 1017-2548(Print)
ISSN 2234-8530(Online)
Volume 40, Number 5
JKCSEZ 40(5)
October 20, 1996 

The Formation of Dendrimeric Silane on Poly(carbosilane): Silane Arborols (Ⅴ)

Carbosilane 고분자상의 나무가지꼴 실란거대분자 형성:Silane Arborols(V)
Chungkyun Kim, Eunmi Park, Inkyung Jung

트리플산에 의한 phenylsilane의 선택적 분해반응에서는 silyltriflate ester 결합을 형성하였다. 1 혹은 2당량배의 트리플산에 의한 Ph3SiH과 carbosilane 고분자 (Ph2SiCH2CH2CH2)n의 Ph기 치환반응에서는 1 혹은 2치환 silyltriflate ester 결합을 형성하였으며 이들과 allymagnesium bromide와의 반응에 의해 이에 상응되는 화합물을 높은 수율로 얻었다. Carbosilane 고분자의 나무가지꼴 실란거대분자를 allylation과 hydrosilation법에 의해 제 3세대(G3)까지 합성하였다.

The selective cleavage of phenylsilane by triflic acid gives silyltriflates. The removal of phenyl groups in Ph3SiH and carbosilane polymer (Ph2SiCH2CH2CH2)n with one to two equiv of triflic acid leads to formation of mono- and disubstituted silyltriflate ester bonds. Reaction with allylmagnesium bromide produces corresponding derivatives with good yields. An organosilane dendrimer with allylated carbosilane polymer has been synthesized up to G3 using repetitive allylation hydrosilylation cycles.

347 - 356
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