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Bulletin of the Korean Chemical Society (BKCS)

ISSN 0253-2964(Print)
ISSN 1229-5949(Online)
Volume 15, Number 12
BKCSDE 15(12)
December 20, 1994 

Interaction of Hydrosilanes with the Surface of Rhodium
Bong Hyun Boo*, Seung Ki Hong, Sun Sook Lee, Hyun Sook Kim
Interaction of triethylsilane and diphenylsilane (Ph2SiH2, Ph2SiD2) with the surfaces of rhodium has been examined by trapping the reaction intermediates with 2,3-dimethyl-l,3-butadiene. 1,4-Hydrosilylation of the diene is predominantly observed to occur under mild condition over the rhodium catalyst. It is inferred from the product analyses that silylene and silyl radicals bonded to rhodium surfaces are the intermediates for addition of silylene to the diene, and for 1,4-hydrosilylation, respectively.
1103 - 1107
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