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Bulletin of the Korean Chemical Society (BKCS)

ISSN 0253-2964(Print)
ISSN 1229-5949(Online)
Volume 31, Number 2
BKCSDE 31(2)
February 20, 2010

Title	The Properties of RF Sputtered Zirconium Oxide Thin Films at Different Plasma Gas Ratio
Author	Juyun Park, Jin Kook Heo, Yong Cheol Kang*
Keywords	RF sputtering, Zirconium oxide, Thin films, XPS
Abstract	Zirconium oxide thin films deposited on the p-type Si(100) substrates by radio-frequency (RF) reactive magnetron sputtering with different plasma gas ratios have been studied by using spectroscopic ellipsometry (SE), atomic force microscopy (AFM), X-ray diffraction (XRD), and X-ray photoelectron spectroscopy (XPS). The deposition of the films was monitored by the oxygen gas ratio which has been increased from 0 to 80%. We found that the thickness and roughness of the zirconium oxide thin films are relatively constant. The XRD revealed that the deposited thin films have polycrystalline phases, Zr(101) and monoclinic ZrO₂ (131). The XPS result showed that the oxidation states of zirconium suboxides were changed to zirconia form with increasing O₂ gas ratio.
Page	397 - 400
Full Text	PDF

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