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Bulletin of the Korean Chemical Society (BKCS)

ISSN 0253-2964(Print)
ISSN 1229-5949(Online)
Volume 27, Number 3
BKCSDE 27(3)
March 20, 2006 

Molecular Emission of CF4 Gas in Low-pressure Inductively Coupled Plasma
T. Y. Jung, D. H. Kim, H. B. Lim*
Fluorinated carbon, CF radical, Low-pressure plasma, Inductively coupled plasma
CF4 gas is one of the most common chemicals used for dry etching in semiconductor manufacturing processes. For application to the etching process and environmental control, the low-pressure inductively coupled plasma (LP-ICP) was employed to obtain the spectrum of CF4 gas. In terms of the analysis of the spectra, trace CF radical by A-X and B-X transitions was detected. The other CFx radicals, such as CF2 and CF3, were not seen in this experiment whereas strong C and C2 emissions, dissociation products of CF4 gas, were observed.
373 - 376
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