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Bulletin of the Korean Chemical Society (BKCS)

ISSN 0253-2964(Print)
ISSN 1229-5949(Online)
Volume 27, Number 3
BKCSDE 27(3)
March 20, 2006

Title	Molecular Emission of CF₄ Gas in Low-pressure Inductively Coupled Plasma
Author	T. Y. Jung, D. H. Kim, H. B. Lim*
Keywords	Fluorinated carbon, CF radical, Low-pressure plasma, Inductively coupled plasma
Abstract	CF₄ gas is one of the most common chemicals used for dry etching in semiconductor manufacturing processes. For application to the etching process and environmental control, the low-pressure inductively coupled plasma (LP-ICP) was employed to obtain the spectrum of CF₄ gas. In terms of the analysis of the spectra, trace CF radical by A-X and B-X transitions was detected. The other CF_x radicals, such as CF₂ and CF₃, were not seen in this experiment whereas strong C and C₂ emissions, dissociation products of CF₄ gas, were observed.
Page	373 - 376
Full Text	PDF

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