ISSN 1017-2548(Print)
ISSN 2234-8530(Online)
Volume 39, Number 10
JKCSEZ 39(10)
August 20, 1995 

The theory previously proposed to simulate hole depth in the weak burn intensity limit is extended to examine the hole depth at arbitrary burn intensity using 3-level system model. The hole spectrum simulated using constant fluence gives different hole depth for strong burn intensity while it gives same hole depth for weak burn intensity region. The calculated hole growth curves are compared with published experimental data for oxazine720 in glycerol and tetracene in MTHF glass.