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Journal of the Korean Chemical Society (JKCS)

ISSN 1017-2548(Print)
ISSN 2234-8530(Online)
Volume 48, Number 6
JKCSEZ 48(6)
December 20, 2004

Title	Time-Dependent Cyclic Modulation Process of CH4 Gas Flow Rate in CH4-H2-O2 Plasma for the Enhancement of Diamond Film Characteristics 다이아몬드 막 특성 향상을 위한 CH4-H2-O2 플라즈마 내의 CH4 기체 유량의 시간 의존 싸이클릭 변조 프로세스
Author	Sung-Hoon Kim 김성훈
Keywords	다이아몬드 막, CH4 기체 유량의 시간의존 변조, 산소 혼입, 마이크로파 플라즈마 화학 기상 증착 장치 , Diamond Films, Time-Dependent Modulation of CH4 Flow Rate, Oxygen Incorporation, Microwave Plasma-Enhanced Chemical Vapor Deposition
Abstract	No Abstract
Page	663 - 0
Full Text	PDF

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