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Bulletin of the Korean Chemical Society (BKCS)

ISSN 0253-2964(Print)
ISSN 1229-5949(Online)
Volume 18, Number 8
BKCSDE 18(8)
August 20, 1997 

Microstructure and Third Order Optical Nonlinearities of Ion-Implanted and Thermally Annealed Cu-SiO2 Thin Films
Lee Chae, Minyung Lee*, Hyun Kyong Kim, Dae Won Moon
The crystal structure and optical properties of copper nanoparticles, prepared in fused silica by ion-implantation and subsequent heat-treatment, were characterized by X-ray, TEM, linear absorption, and degenerate four-wave mixing (DFWM) technique. The X-ray data show fcc lattice structure of the nanocrystals and their size was measured as 8-20 nanometer by high resolution TEM. Using DFWM, the third-order nonlinear optical coefficient of the Cu-SiO2 thin films was measured as 0.4-1.1×10-8 esu in the surface plasmon resonance absorption region (540-570 nm).
886 - 889
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