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Bulletin of the Korean Chemical Society (BKCS)

ISSN 0253-2964(Print)
ISSN 1229-5949(Online)
Volume 10, Number 5
BKCSDE 10(5)
May 20, 1989 

 
Title
Reaction of Triethylsilyl Radical with Sulfides, a Laser Falsh Photoylsis Study
Author
M. S. Platz, Woobung Lee*
Keywords
Abstract
Triethylsilyl radical was generated by laser flash photolysis of a 1:1 (v/v)solution of triethylsliance and di-tert-butyl peroxide. The silicon centered radical was reacted with sulfides to give carbon centered radicals by displacement at sulfar. The carbon radicals were readily detected by their transient absorption spectra. The absolute rate of reaction of triethylsilyl radical with 9-fluorenylphenylsulfide, di-n-butylsulfide, di-sec-butyl, di-tert-butyl sulfide and di-n-butyl disulfide are 2.40±0.12ⅹ 108 M-1s-1, 11.21±0.89ⅹ106 M-1s-1, 8.79± 0.73ⅹ106 M-1s-1, 3.29±0.18ⅹ106 M-1s-1, 3.41± 0.09ⅹ108 M-1s-1, respectively.
Page
422 - 426
Full Text
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