Current time in Korea 06:19 Dec 02 (Wed) Year 2020 KCS KCS Publications
KCS Publications
My Journal  Log In  Register
HOME > Search > Browsing(BKCS) > Archives

Bulletin of the Korean Chemical Society (BKCS)

ISSN 0253-2964(Print)
ISSN 1229-5949(Online)
Volume 6, Number 4
April 20, 1985 

A Kinetic Study of Br Atom Reactions with Trimethylsilane by the VLPR (Very Low Pressure Reactor) Technique
Kwang Yul Choo, Mu Hyun Choe
A Very Low Pressure Reactor (VLPR) is constructed for the kinetic study of atom-molecule bimolecular elementary reactions. The basic principles and the versatility of the method are described. By using the VLPR technique the forward (k1) and the reverse (k-1) rate constants for Br atom reaction with trimethylsilane are studied; Br· + (CH3)3SiH k1 ↔ k-1 HBr + (CH3)3Si. From the kinetic data and the entropy estimation the bond dissociation energy for Si-H bond in trimethylsilane is calculated to be 90.1 kcal/mole (±1.1 kcal/mole). The Arrhenius parameters for k1 are found to be log A = 10.6 l/mole·sec, Ea = 4.4 kcal/mole respectively. For the comparison purpose analogous reaction for carbon compound ; Br· + (CH3)3CH → HBr + (CH3)3C· was also studied. The corresponding rate constant and equilibrium constant at 25℃ are found to be 2.67 × 106/mole·sec and 160 respectively.
196 - 202
Full Text