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Bulletin of the Korean Chemical Society (BKCS)

ISSN 0253-2964(Print)
ISSN 1229-5949(Online)
Volume 34, Number 1
BKCSDE 34(1)
January 20, 2013 

Random Walk Simulation for the Growth of Monolayer in Dip Pen Nanolithography
Hyojeong Kim, Soojung Ha, Joonkyung Jang*
Random walk, Self-assembled monolayer, Dip-pen nanolithography, Dendrite, Diffusion
Using a simple random walk model, this study simulated the growth of a self-assembled monolayer (SAM) pattern generated by dip-pen nanolithography (DPN). In this model, the SAM pattern grew mainly via the serial pushing of molecules deposited from the tip. This study examined various SAM patterns, such as lines, crosses and letters, by changing the tip scan speed.
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