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Bulletin of the Korean Chemical Society (BKCS)

ISSN 0253-2964(Print)
ISSN 1229-5949(Online)
Volume 29, Number 8
BKCSDE 29(8)
August 20, 2008 

Synthesis of Novel Platinum Precursor and Its Application to Metal Organic Chemical Vapor Deposition of Platinum Thin Films
Sun Sook Lee, Ho-Min Lee, Min-Jung Park, Ki-Seok An, Jinkwon Kim, Jong-Heun Lee, Taek-Mo Chung*, Chang Gyoun Kim*
Platinum, Precursor, MOCVD, Aminoalkoxide, Thin films
A novel platinum aminoalkoxide complex, Pt(dmamp)2 has been prepared by the reaction of cis-(py)2PtI2 with two equivalents of Na(dmamp) (dmamp = 1-dimethylamino-2-methyl-2-propanolate). Single-crystal X-ray crystallographic analysis shows that the Pt(dmamp)2 complex keeps a square planar geometry with each two nitrogen atoms and two oxygen atoms having trans configuration. Platinum films have been deposited on TaN/ Ta/Si substrates by metal organic chemical vapor deposition (MOCVD) using Pt(dmamp)2. As-deposited platinum thin films did not contain any appreciable amounts of impurities except a little carbon. As the deposition temperature was increased, the films resistivity and deposition rate increased. The electrical resistivity (13.6 μ Ωcm) of Pt film deposited at 400 oC is a little higher than the bulk value (10.5 μ Ωcm) at 293 K. The chemical composition, crystalline structure, and morphology of the deposited films were investigated by X-ray photoelectron spectroscopy, X-ray diffraction, and atomic force microscopy.
1491 - 1494
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