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Bulletin of the Korean Chemical Society (BKCS)

ISSN 0253-2964(Print)
ISSN 1229-5949(Online)
Volume 28, Number 3
BKCSDE 28(3)
March 20, 2007 
 
Title
 Reaction of NO on Vanadium Oxide Surfaces: Observation of the NO Dimer Formation
Author
 Hyun Suck Jeong, Chang Min Kim*
Keywords
 VO, NO, NO dimer, XPS, NEXAFS
Abstract
 The adsorption and surface reactions of NO on a VO/V(110) surface have been investigated using X-ray photoelectron spectroscopy (XPS), near-edge X-ray absorption fine structure, and temperature programmed desorption (TPD) technique. NO is molecularly adsorbed on VO/V(110) at 80 K. As the surface coverage of NO increases, the NO dimer is formed on the surface at 80 K. Both NO and (NO)2 are adsorbed on the surface with the N-O bond perpendicular to the surface. (NO)2 decomposes at ~100 K and the reaction product is desorbed as N2O. Decomposition of NO takes place when the surface temperature is higher than 273 K.
Page
 413 - 416
Full Text
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