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Bulletin of the Korean Chemical Society (BKCS)

ISSN 0253-2964(Print)
ISSN 1229-5949(Online)
Volume 22, Number 10
BKCSDE 22(10)
October 20, 2001 

Alcohol-Assisted Photocrosslinking of Poly(vinyl alcohol) for Water-Soluble Photoresists
Sang-Yeon Shim, Jong-Man Kim
Photoresist, Polymer, Water-soluble, Image.
Patterned negative-tone images on the polymer film have been prepared based on the photoinduced crosslinking of water soluble poly(vinyl alcohol) (PVA) in the presence of various alcohols. Irradiation of a polymer film containing PVA, a photoacid generator and an alcohol as a crosslinker with 254-nm UV through a photomask followed post-exposure bake (PEB) allowed generation of negative-tone relief images at 5 ㎛ resolution in the polymer film. Among various alcohols tested, aromatic alcohols such as pyrogallol and resorcinol were found to be superior to aliphatic alcohols such as sucrose and inositol in terms of resist sensitivity.
1120 - 1122
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