Journal Information

Journal ID (publisher-id): chemical

Title: Journal of the Korean Chemical Society

Translated Title (ko): 대한화학회지

ISSN (print): 1017-2548

ISSN (electronic): 2234-8530

Publisher: Korean Chemical Society대한화학회

Article Information

Date received: 29 November 2018

Date accepted: 12 December 2018

Publication date (print): 20 February 2019

Volume: 63

Issue: 1

Pages: 1-3

Publisher ID: JCGMDC_2019_v63n1_s45

Electrochemical Determination of As(III) at Nanoporous Gold Electrodes with Controlled Surface Area

Min Ji Seo

Kanido Camerun Kastro

Jongwon Kim[*]

Department of Chemistry, Chungbuk National University, Cheongju 28644, Korea

Author notes:

Correspondence to: [*] E-mail: jongwonkim@chungbuk.ac.kr

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FigureS1.

(a) Cyclic voltammograms of NPG electrodes according to reaction time in 0.1 M H₂SO₄ at a scan rate of 50 mV s^-1. (b) Dependence of Rf value of NPG electrodes upon the reaction time. NPG electrodes prepared by anodization in 0.1 M phosphate buffers (pH 8) containing 1 M KCl. (c) SEM image of typical NPG layers prepared by anodization.

FigureS2.

(a) and (b) SWV response on NPG electrodes with different surface area in 3 μM As(III) + 1.0 M H₂SO₄. (c) Comparison of blank SWV responses of NPG electrodes in 1.0 M H₂SO₄ in the absence of As(III).

FigureS3.

SWV obtained on NPG (50 s) electrodes in 1 M HCl containing 5 μM As(III) at various deposition potentials. Predeposition time = 150 s.

FigureS4.

SWVs obtained on a flat Au electrodes in 1 M HCl containing various concentrations of As(III) at different pre-deposition times.

TableS1.

Dependence upon the deposition time of sensitivity on flat Au electrode and NPG (50 s)

Deposition Time (s)	Electrode	Sensitivity (μA/μM)	NPG (50 s)/Flat Au sensitivity
50	Flat Au	1.12	1.79
50	NPG (50 s)	2.01	1.79
150	Flat Au	2.60	3.16
150	NPG (50 s)	8.21	3.16
400	Flat Au	1.96	11.3
400	NPG (50 s)	22.2	11.3

FigureS5.

(a) SWVs obtained on flat Au electrodes in 1 M HCl containing various concentrations of As(III) in the presence of 5 μM Cu(II). Deposition potential = -0.2 V and pre-deposition time = 150 s. (b) Calibration curves of As detection in the presence and absence of Cu(II).

FigureS6.

SWVs obtained on (a) flat Au and (b) NPG (50 s) electrodes for 5 μM As(III) in the presence of 1 ~ 5 μM Cu(II) in 1.0 M HCl. Deposition potential = −0.2 V and pre-deposition time = 150 s.